Item Name Aluminum (Al) sputtering target
Available Purity 4N,5N
Dimension As per your request
Available Shape Rectangle, Round, Rotary
Density 2.70g/m3
Melting point 660.37℃
Boiling point 2467℃
Technology Vacuum Melting, Patented thermo-mechanical process and machine work
Application Flat Panel Display,Glass Coating& Decoration, Semiconductors, Micro-Electronics etc.